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According to https://www.filtsep.com,
Increasingly severe global water shortages have prompted semiconductor manufacturers to consider using recycled wastewater and seawater as sources for ultrapure water for manufacturing semiconductors.
Production of ultrapure water from these water sources requires advanced technology capable of removing salts, silica, boron, urea, alcohols, and other impurities. Urea poses a particular challenge, as it impacts both the safety of drinking water and the quality of ultrapure water used in photolithography processes for semiconductor manufacturing. Urea is hard to remove, however, owing to its small molecular size and electrically neutral nature, much like boron in seawater. Improving removal rates for urea and boron while maintaining high water production rates has been a significant challenge in developing RO membranes.
By innovating the RO membrane manufacturing process, Toray has developed a new membrane structure control technology that allows selective water permeation and enhances the removal of urea, boron, alcohol, and other substances. These efforts have culminated in the TBW-XHR series of RO membrane elements, whose urea removal efficiency is double that of conventional systems, achieving high water permeability at low pressure.
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